Product Category Search
Top rated lithography
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Best overall
ASML Twinscan NXT:2000i
High-volume semiconductor manufacturing lithography system with high throughput and low cost of ownership. Enables production of the most advanced logic and memory chips.
- High throughput
- Low cost of ownership
- Advanced technology
- High purchase price
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Best budget pick
KLA-Tencor Archer 500L
Patterned wafer inspection system for defect detection and classification. Provides high sensitivity and speed for various wafer sizes and types.
- High sensitivity
- Fast inspection speed
- Flexible wafer handling
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Best for advanced nodes
Nikon NSR-S322F
Immersion lithography system for 7nm and below logic and memory devices. Offers high resolution, high throughput, and low defectivity.
- High resolution
- High throughput
- Low defectivity
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Best for mask inspection
Zeiss AIMS fab
Mask and wafer inspection system for reticle and wafer quality control. Provides high-speed and high-sensitivity inspection.
- High-speed inspection
- High-sensitivity detection
- Flexible inspection modes
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Best for high-volume manufacturing
Canon FPA-6300ES6a
Immersion lithography system for high-volume manufacturing of logic and memory devices. Offers high throughput and high yield.
- High throughput
- High yield
- Low cost of ownership
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Best for EUV lithography
ASML TWINSCAN NXT:2050i
EUV lithography system for high-volume manufacturing of the most advanced logic and memory chips. Enables production of 5nm and below nodes.
- High resolution
- High throughput
- Advanced EUV technology
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Best for R&D and low-volume production
SUSS MicroTec AS200
Coater and developer system for R&D and low-volume production of semiconductors and other devices. Offers flexibility and ease of use.
- Flexible and easy to use
- High-quality coatings
- Low cost of ownership
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Best for patterned wafer inspection
KLA-Tencor SPARK 201
Patterned wafer inspection system for defect detection and classification. Provides high sensitivity and speed for various wafer sizes and types.
- High sensitivity
- Fast inspection speed
- Flexible wafer handling
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Best for etch and deposition
Applied Materials Centura iE
Etch and deposition system for semiconductor manufacturing. Offers high throughput, low defectivity, and advanced process control.
- High throughput
- Low defectivity
- Advanced process control